Chemical Sciences Journal

Department of Biotechnology, Gulbarga University, Gulbarga, India

Publications

• Perspective   
  Study of SiO₂ Etching using Plasma Diagnostics
  Author(s): Rami Onkar*
  
  Plasma is described as semi-neutral plasma of charged, unbiased particles that exhibits collective behaviour. The distinctive features that distinguish plasma from other release characteristics are applied in many contemporary and research sectors, such as regulating the component particles for specific uses... Read More»
  DOI: 10.37421/2150-3494.2022.13.327

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